Nucleation-related defect-free GaP/Si(100) heteroepitaxy via metal-organic chemical vapor deposition
GaP/Si heterostructures were grown by metal-organic chemical vapor deposition in which the formation of all heterovalent nucleation-related defects (antiphase domains, stacking faults, and microtwins) were fully and simultaneously suppressed, as observed via transmission electron microscopy (TEM). T...
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Veröffentlicht in: | Applied physics letters 2013-04, Vol.102 (14) |
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Hauptverfasser: | , , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | GaP/Si heterostructures were grown by metal-organic chemical vapor deposition in which the formation of all heterovalent nucleation-related defects (antiphase domains, stacking faults, and microtwins) were fully and simultaneously suppressed, as observed via transmission electron microscopy (TEM). This was achieved through a combination of intentional Si(100) substrate misorientation, Si homoepitaxy prior to GaP growth, and GaP nucleation by Ga-initiated atomic layer epitaxy. Unintentional (311) Si surface faceting due to biatomic step-bunching during Si homoepitaxy was observed by atomic force microscopy and TEM and was found to also yield defect-free GaP/Si interfaces. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.4801498 |