Highly stable charge generation layers using caesium phosphate as n-dopants and inserting interlayers

Highly stable and efficient charge generation layers (CGLs) comprising caesium phosphate (Cs 3 PO 4 ) doped 2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline (BCP) as n -type organic semiconductor and molybdenum trioxide (MoO 3 ) doped N,N′-di-(naphthalen-1-yl)-N,N′-diphenyl-benzidine ( α -NPD) as p -ty...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of applied physics 2012-05, Vol.111 (10), p.103107-103107-7
Hauptverfasser: Diez, Carola, Reusch, Thilo C. G., Lang, Erwin, Dobbertin, Thomas, Brütting, Wolfgang
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Highly stable and efficient charge generation layers (CGLs) comprising caesium phosphate (Cs 3 PO 4 ) doped 2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline (BCP) as n -type organic semiconductor and molybdenum trioxide (MoO 3 ) doped N,N′-di-(naphthalen-1-yl)-N,N′-diphenyl-benzidine ( α -NPD) as p -type organic semiconductor, respectively, are presented. By inserting narrow-gap organic copper-phthalocyanine (CuPc) and wide-gap insulating aluminum oxide (Al 2 O 3 ) as interlayer (IL), we show that the long-term stability of the CGL can be improved. The variation of the CuPc IL thickness yields an optimum of 8nm as a trade-off between minimal operating voltage and maximum voltage stability of the CGL. Luminance-current density-voltage characteristics and lifetime measurements of stacked green organic light emitting diodes (OLEDs) confirm the functionality and high voltage stability of the presented CGL. The luminous efficacy of the stacked OLED compared to the non-stacked reference device is nearly unchanged. However, the lifetime of the stacked device is enhanced by a factor of 3.5. Consistent with our experimental findings, we propose a model of the energy-level diagram of a fully doped CGL with IL based on a field-assisted tunneling mechanism.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.4720064