Sputtered flux distribution on the substrate in electron cyclotron resonance sputtering simulation and experimental study

Electron cyclotron resonance plasma based sputtering is characterized by low pressure operation with high ion density. The distribution of sputtered flux on the substrate at different pressures and target–substrate distances has been simulated using Monte Carlo methods and compared with experimental...

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Veröffentlicht in:Journal of applied physics 2000-05, Vol.87 (10), p.7544-7550
Hauptverfasser: Deenamma Vargheese, K., Mohan Rao, G.
Format: Artikel
Sprache:eng
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Zusammenfassung:Electron cyclotron resonance plasma based sputtering is characterized by low pressure operation with high ion density. The distribution of sputtered flux on the substrate at different pressures and target–substrate distances has been simulated using Monte Carlo methods and compared with experimental results. It has been shown that due to cylindrical geometry of the target, at low pressures, the variation as a function of distance is different from conventional sputtering. At high pressures, however, the uniformity of sputtered flux increases with the target–substrate distance. Using the simulated data the variation of the thickness with sputtering pressure and target–substrate distance has been studied.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.373021