Photon emission and related hot-carrier effects in polycrystalline silicon thin-film transistors

The photon emission induced by the drain avalanche in polycrystalline silicon thin-film transistors (polysilicon TFTs) has been studied in wide drain and gate voltage ranges. As the photon emission phenomenon is closely related to hot-carrier effects, the gate and drain bias conditions for maximum d...

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Veröffentlicht in:Journal of applied physics 1999-05, Vol.85 (9), p.6917-6919
Hauptverfasser: Farmakis, F. V., Dimitriadis, C. A., Brini, J., Kamarinos, G., Gueorguiev, V. K., Ivanov, Tz. E.
Format: Artikel
Sprache:eng
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Zusammenfassung:The photon emission induced by the drain avalanche in polycrystalline silicon thin-film transistors (polysilicon TFTs) has been studied in wide drain and gate voltage ranges. As the photon emission phenomenon is closely related to hot-carrier effects, the gate and drain bias conditions for maximum device degradation have been determined from measurements of the emitted light intensity. In n-channel polysilicon TFTs, the effects of bias stressing at the maximum light emission are related to hot-hole trapping into the gate oxide near the drain and to formation of acceptor-like interface states consisted of midgap states and band tails.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.370105