Photon emission and related hot-carrier effects in polycrystalline silicon thin-film transistors
The photon emission induced by the drain avalanche in polycrystalline silicon thin-film transistors (polysilicon TFTs) has been studied in wide drain and gate voltage ranges. As the photon emission phenomenon is closely related to hot-carrier effects, the gate and drain bias conditions for maximum d...
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Veröffentlicht in: | Journal of applied physics 1999-05, Vol.85 (9), p.6917-6919 |
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Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | The photon emission induced by the drain avalanche in polycrystalline silicon thin-film transistors (polysilicon TFTs) has been studied in wide drain and gate voltage ranges. As the photon emission phenomenon is closely related to hot-carrier effects, the gate and drain bias conditions for maximum device degradation have been determined from measurements of the emitted light intensity. In n-channel polysilicon TFTs, the effects of bias stressing at the maximum light emission are related to hot-hole trapping into the gate oxide near the drain and to formation of acceptor-like interface states consisted of midgap states and band tails. |
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ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.370105 |