Erratum: “Plasma chemistry aspects of a -Si:H deposition using an expanding thermal plasma” [J. Appl. Phys. 84 , 2426 (1998)]
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| Veröffentlicht in: | Journal of applied physics 1999-01, Vol.85 (2), p.1243-1243 |
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| Sprache: | eng |
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| container_end_page | 1243 |
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| container_issue | 2 |
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| container_title | Journal of applied physics |
| container_volume | 85 |
| creator | van de Sanden, M. C. M. Severens, R. J. Kessels, W. M. M. Meulenbroeks, R. F. G. Schram, D. C. |
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| doi_str_mv | 10.1063/1.369257 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0021-8979 |
| ispartof | Journal of applied physics, 1999-01, Vol.85 (2), p.1243-1243 |
| issn | 0021-8979 1089-7550 |
| language | eng |
| recordid | cdi_crossref_primary_10_1063_1_369257 |
| source | AIP Journals Complete; AIP Digital Archive |
| title | Erratum: “Plasma chemistry aspects of a -Si:H deposition using an expanding thermal plasma” [J. Appl. Phys. 84 , 2426 (1998)] |
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