Grown-in precipitates in heavily phosphorus-doped Czochralski silicon

Through comparing the oxygen precipitation in the heavily and lightly phosphorus (P)-doped Czochralski silicon (CZ Si) specimens subjected to the simulated cooling processes of silicon ingot, we researched the influences of heavily P doping on grown-in precipitates by preferential etching and transmission electron microscopy (TEM). It was found that grown-in precipitates were more significant in heavily P-doped CZ Si than in lightly one. Most grown-in precipitates in heavily P-doped CZ Si were generated at (800-600) °C. The significant grown-in oxygen precipitates in the heavily P-doped CZ Si would change the density and morphology of oxygen precipitation. TEM examination revealed that the grown-in precipitates in heavily P-doped CZ Si were amorphous oxygen precipitates composed of tiny precipitates in essential. Although more or less phosphorus may be incorporated in the grown-in precipitates, however, phosphorus cannot be detected so far. We further confirmed that extending annealing at 550°C produced significant silicon phosphide (SiP) precipitation in heavily P-doped CZ Si. Summarily, enhancement of grown-in oxygen precipitates was attributed to SiP precipitation and high-concentration vacancy, tentatively. Nonetheless, further investigation on the essential of grown-in precipitates in heavily P-doped CZ Si is worthy.