Enhanced electrostatic discharge properties of nitride-based light-emitting diodes with inserting Si-delta-doped layers

We report significantly improved electrostatic discharge (ESD) properties of InGaN/GaN-based light-emitting diodes (LEDs) with inserting Si-delta-doped layers between multiple quantum wells and n -cladding layer. The ESD endurance voltage increased from −1200 V to −4000 V with the insertion of delta-doped layers. The mechanism of the enhanced ESD properties was then investigated. According to capacitance-voltage results, the factor of capacitance modulation was ruled out. However, infrared microscopy image proved better current spreading in the LEDs with delta-doped layers. In addition, current-voltage, photoluminescence, and atomic force microscope measurements demonstrated substantial quality improvements. These two reasons were considered as the dominant mechanisms of the enhanced ESD properties.