Low-temperature sputter deposition of high-coercivity Co-Cr films for perpendicular recording
A low-temperature magnetron sputter-deposition method for Co-Cr medium has been developed. Films of 17 wt % Cr-Co were deposited to a thickness of 100–200 nm onto glass substrates over an extremely wide range of Ar gas pressures at room temperature. A high hcp c-axis orientation to the film normal (...
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| Veröffentlicht in: | Journal of applied physics 1994-05, Vol.75 (10), p.5984-5986 |
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| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | A low-temperature magnetron sputter-deposition method for Co-Cr medium has been developed. Films of 17 wt % Cr-Co were deposited to a thickness of 100–200 nm onto glass substrates over an extremely wide range of Ar gas pressures at room temperature. A high hcp c-axis orientation to the film normal (Δθ50 |
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| ISSN: | 0021-8979 1089-7550 |
| DOI: | 10.1063/1.355533 |