Dielectric polarization relaxation measurement in α-SiO2 by means of a scanning electron microscope technique

A scanning electron microscope is used as a tool to study dielectric relaxation processes in α-SiO2 by measuring the leakage current in the sample surrounded by a metallic aperture. A transient time (tt) of the order of a few seconds appears before the steady-state current is established. The time d...

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Veröffentlicht in:Journal of applied physics 1993-07, Vol.74 (2), p.1250-1255
Hauptverfasser: OH, K. H, LE GRESSUS, C, GONG, H, TAN, B. T. G, DING, X. Z
Format: Artikel
Sprache:eng
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Zusammenfassung:A scanning electron microscope is used as a tool to study dielectric relaxation processes in α-SiO2 by measuring the leakage current in the sample surrounded by a metallic aperture. A transient time (tt) of the order of a few seconds appears before the steady-state current is established. The time dependence of the trapping rate is found to follow a power law and to be related to relaxation processes of a dielectric under electrical and thermal stress.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.354928