Hydrogen effects on oxygen precipitation in Czochralski silicon crystals

We reported enhanced oxygen precipitation in quenched Czochralski silicon crystals after solution annealing at 1270 °C in nitrogen or in dry oxygen [J. Appl. Phys. 66, 3958 (1989)]. We attributed this phenomena to intrinsic point defects. However, hydrogen was introduced into samples during solution...

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Veröffentlicht in:Journal of applied physics 1993-07, Vol.74 (2), p.913-916
Hauptverfasser: HARA, A, AOKI, M, FUKUDA, T, OHSAWA, A
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container_title Journal of applied physics
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creator HARA, A
AOKI, M
FUKUDA, T
OHSAWA, A
description We reported enhanced oxygen precipitation in quenched Czochralski silicon crystals after solution annealing at 1270 °C in nitrogen or in dry oxygen [J. Appl. Phys. 66, 3958 (1989)]. We attributed this phenomena to intrinsic point defects. However, hydrogen was introduced into samples during solution annealing at 1270 °C and aggregates of hydrogen were formed during quenching. This article examines hydrogen aggregates by Secco etching and transmission electron microscope. Hydrogen-related aggregates are found to be related to enhanced oxygen precipitation.
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subjects Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Equations of state, phase equilibria, and phase transitions
Exact sciences and technology
Materials science
Physics
Solid solution hardening, precipitation hardening, and dispersion hardening
aging
Solid solution, precipitation, and dispersion hardening
aging
Solubility, segregation, and mixing
phase separation
Treatment of materials and its effects on microstructure and properties
title Hydrogen effects on oxygen precipitation in Czochralski silicon crystals
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