Polishing of YBa2Cu3O7-y by He-ion etching
Clean polishing is performed by helium-ion etching on a surface of high-Tc YBa2Cu3O7−y. Based on a knock-on cascade model, the decrease of surface roughness is discussed. A rate process of etching is applied for the surface roughness of the high-Tc YBa2Cu3O7−y.
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| Veröffentlicht in: | Journal of applied physics 1992, Vol.71 (1), p.347-349 |
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| Format: | Artikel |
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| container_end_page | 349 |
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| container_issue | 1 |
| container_start_page | 347 |
| container_title | Journal of applied physics |
| container_volume | 71 |
| creator | INOUE, N TAKAHASHI, Y SUDO, T SAKAMOTO, K SHIMA, T NISHI, Y |
| description | Clean polishing is performed by helium-ion etching on a surface of high-Tc YBa2Cu3O7−y. Based on a knock-on cascade model, the decrease of surface roughness is discussed. A rate process of etching is applied for the surface roughness of the high-Tc YBa2Cu3O7−y. |
| doi_str_mv | 10.1063/1.350713 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0021-8979 |
| ispartof | Journal of applied physics, 1992, Vol.71 (1), p.347-349 |
| issn | 0021-8979 1089-7550 |
| language | eng |
| recordid | cdi_crossref_primary_10_1063_1_350713 |
| source | AIP Digital Archive |
| subjects | Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physics Solid surfaces and solid-solid interfaces Surface structure and topography Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) |
| title | Polishing of YBa2Cu3O7-y by He-ion etching |
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