Phase stability and decomposition products of Ti-Al-Ta-N thin films
Ab initio calculations of quaternary alloys were used to predict the phase stability of ( Ti 1 − x Al x ) 1 − y Ta y N . Experimental observation of a dual phase structure containing wurtzite AlN and cubic Ti 1 − y Ta y N after thermal decomposition of sputter deposited thin films by vacuum annealin...
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Veröffentlicht in: | Applied physics letters 2010-10, Vol.97 (15), p.151901-151901-3 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | Ab initio
calculations of quaternary alloys were used to predict the phase stability of
(
Ti
1
−
x
Al
x
)
1
−
y
Ta
y
N
. Experimental observation of a dual phase structure containing wurtzite AlN and cubic
Ti
1
−
y
Ta
y
N
after thermal decomposition of sputter deposited thin films by vacuum annealing to
1400
°
C
is in excellent agreement with the calculated phase stabilities of the investigated compositions. We found positive mixing enthalpies for
Ti
1
−
x
Al
x
N
and
Al
1
−
y
Ta
y
N
, with maximum values of 0.25 eV/atom and 0.30 eV/atom, respectively, but negative values for
Ti
1
−
y
Ta
y
N
over the whole composition range. The difference in lattice parameters obtained from experiments and
ab initio
calculations is within
∼
1
%
. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.3495783 |