Characterization of a remote hydrogen plasma reactor with electron spin resonance

Gas phase chemical reactions, of importance in the deposition of amorphous semiconductors, were studied in a remote hydrogen plasma reactor with electron spin resonance (ESR). The following reactant pairs (and their observed room-temperature rate coefficients) were characterized: (1) H+SiH4(2.4×1011...

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Veröffentlicht in:	Journal of applied physics 1991-02, Vol.69 (4), p.2631-2634
Hauptverfasser:	JOHNSON, N. M, WALKER, J, STEVENS, K. S
Format:	Artikel
Sprache:	eng
Schlagworte:	Exact sciences and technology Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma devices
Online-Zugang:	Volltext
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