Enhanced diffusion upon amorphous-to-nanocrystalline phase transition in Mo/B4C/Si layered systems

Enhanced diffusion upon amorphous-to-nanocrystalline phase transition in Mo/B4C/Si layered systems

The effect of an amorphous-to-nanocrystalline phase transition on the diffusion across an interface layer of subnanometer thickness has been investigated in real-time. The diffusion in the Mo/B4C/Si thin film structure studied was found to instantaneously enhance by an order of magnitude upon the fo...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of applied physics 2010-07, Vol.108 (1)
Hauptverfasser: de Rooij-Lohmann, V. I. T. A., Yakshin, A. E., van de Kruijs, R. W. E., Zoethout, E., Kleyn, A. W., Keim, E. G., Gorgoi, M., Schäfers, F., Brongersma, H. H., Bijkerk, F.
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The effect of an amorphous-to-nanocrystalline phase transition on the diffusion across an interface layer of subnanometer thickness has been investigated in real-time. The diffusion in the Mo/B4C/Si thin film structure studied was found to instantaneously enhance by an order of magnitude upon the formation of nanocrystals inducing the atomic-scale onset of grain boundary diffusion.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.3460107