Origin of pyramidal hillocks on GaN thin films grown on free-standing m -plane GaN substrates

The relationship between pyramidal hillocks and dislocations was studied for GaN thin films grown by metalorganic chemical vapor deposition on low-dislocation-density free-standing m -plane GaN substrates. Four-sided pyramidal hillocks were observed on GaN thin films grown on nominally on-axis m -pl...

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Veröffentlicht in:Applied physics letters 2010-06, Vol.96 (23), p.231907-231907-3
Hauptverfasser: Farrell, R. M., Haeger, D. A., Chen, X., Gallinat, C. S., Davis, R. W., Cornish, M., Fujito, K., Keller, S., DenBaars, S. P., Nakamura, S., Speck, J. S.
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Sprache:eng
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Zusammenfassung:The relationship between pyramidal hillocks and dislocations was studied for GaN thin films grown by metalorganic chemical vapor deposition on low-dislocation-density free-standing m -plane GaN substrates. Four-sided pyramidal hillocks were observed on GaN thin films grown on nominally on-axis m -plane GaN substrates. Cathodoluminescence measurements revealed the presence of a dislocation at the apex of each pyramidal hillock. High-resolution atomic force microscopy images showed a pinned step at the apex of each pyramidal hillock and a spiral ramp around the termination of the step, indicating that the pyramidal hillocks arise from spiral growth around screw-component dislocations intersecting the surface of the crystal.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.3447926