Electrical characteristics of Au/p-AlSb metal-insulator-semiconductor Schottky diodes
Metal-insulator-semiconductor Schottky barrier diodes have been prepared on p-type bulk AlSb by evaporating gold on a chemically etched (100) AlSb surface. The existence of an oxide-rich interfacial layer between gold and AlSb of ∼70 Å thickness was shown by means of secondary ion mass spectrometry...
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Veröffentlicht in: | Journal of applied physics 1989-06, Vol.65 (12), p.4924-4927 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Metal-insulator-semiconductor Schottky barrier diodes have been prepared on p-type bulk AlSb by evaporating gold on a chemically etched (100) AlSb surface. The existence of an oxide-rich interfacial layer between gold and AlSb of ∼70 Å thickness was shown by means of secondary ion mass spectrometry analysis. The current-voltage (I-V) and capacitance-voltage (C-V) characteristics were measured. The barrier height qφBp(0) obtained from the Richardson plot log(Is/T2) vs (1/nT) is 0.71 eV. The 1/C2-vs-V plot was not a straight line. From the ideality factor at room temperature (n=1.4) and the intercept voltage V0 of the 1/C2-vs-V curve (V0=1.2 V), a density Ds of interface states was evaluated around 5×1011 cm−2 eV−1. |
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ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.343208 |