Electron-paramagnetic-resonance study of heat-treatment centers in n-type silicon

Donor formation in heat-treated phosphorus-doped Czochralski-grown silicon has been studied by electron paramagnetic resonance and resistivity measurements. Both ‘‘thermal-donor-’’ and ‘‘new-donor’’-formation temperature regions (470 and 650 °C, respectively) have been investigated. The results allo...

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Veröffentlicht in:Journal of applied physics 1987-12, Vol.62 (11), p.4404-4405
Hauptverfasser: BEKMAN, H. H. P. T, GREGORKIEWICZ, T, VAN WEZEP, D. A, AMMERLAAN, C. A. J
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Sprache:eng
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Zusammenfassung:Donor formation in heat-treated phosphorus-doped Czochralski-grown silicon has been studied by electron paramagnetic resonance and resistivity measurements. Both ‘‘thermal-donor-’’ and ‘‘new-donor’’-formation temperature regions (470 and 650 °C, respectively) have been investigated. The results allow one to identify the spectra in both regions as arising from the Si-NL10 defect.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.339076