Vacuum-deposited thin-metal-film disk
The fabrication process used in an all-vacuum-deposition thin-metal-film disk will be described. The process consists of planar dc-magnetron sputter deposition of a stainless alloy undercoat onto a 14-in.-diameter AlMg-4 disk substrate, e-beam evaporation of an Fe–Co–Cr alloy magnetic layer at an ob...
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| Veröffentlicht in: | Journal of applied physics 1984-03, Vol.55 (6), p.2254-2256 |
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| Format: | Artikel |
| Sprache: | eng |
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| container_end_page | 2256 |
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| container_issue | 6 |
| container_start_page | 2254 |
| container_title | Journal of applied physics |
| container_volume | 55 |
| creator | Rossi, E. M. McDonough, G. Tietze, A. Arnoldussen, T. Brunsch, A. Doss, S. Henneberg, M. Lin, F. Lyn, R. Ting, A. Trippel, G. |
| description | The fabrication process used in an all-vacuum-deposition thin-metal-film disk will be described. The process consists of planar dc-magnetron sputter deposition of a stainless alloy undercoat onto a 14-in.-diameter AlMg-4 disk substrate, e-beam evaporation of an Fe–Co–Cr alloy magnetic layer at an oblique angle of incidence, planar dc-magnetron sputter deposition of a rhodium overcoat and spray deposition of a liquid lubricant layer. Some mechanical and magnetic performance characteristics of disks, deposited in that fashion, are described. |
| doi_str_mv | 10.1063/1.333627 |
| format | Article |
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M.</au><au>McDonough, G.</au><au>Tietze, A.</au><au>Arnoldussen, T.</au><au>Brunsch, A.</au><au>Doss, S.</au><au>Henneberg, M.</au><au>Lin, F.</au><au>Lyn, R.</au><au>Ting, A.</au><au>Trippel, G.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Vacuum-deposited thin-metal-film disk</atitle><jtitle>Journal of applied physics</jtitle><date>1984-03-15</date><risdate>1984</risdate><volume>55</volume><issue>6</issue><spage>2254</spage><epage>2256</epage><pages>2254-2256</pages><issn>0021-8979</issn><eissn>1089-7550</eissn><abstract>The fabrication process used in an all-vacuum-deposition thin-metal-film disk will be described. The process consists of planar dc-magnetron sputter deposition of a stainless alloy undercoat onto a 14-in.-diameter AlMg-4 disk substrate, e-beam evaporation of an Fe–Co–Cr alloy magnetic layer at an oblique angle of incidence, planar dc-magnetron sputter deposition of a rhodium overcoat and spray deposition of a liquid lubricant layer. Some mechanical and magnetic performance characteristics of disks, deposited in that fashion, are described.</abstract><doi>10.1063/1.333627</doi><tpages>3</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0021-8979 |
| ispartof | Journal of applied physics, 1984-03, Vol.55 (6), p.2254-2256 |
| issn | 0021-8979 1089-7550 |
| language | eng |
| recordid | cdi_crossref_primary_10_1063_1_333627 |
| source | AIP Digital Archive |
| title | Vacuum-deposited thin-metal-film disk |
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