Vacuum-deposited thin-metal-film disk
The fabrication process used in an all-vacuum-deposition thin-metal-film disk will be described. The process consists of planar dc-magnetron sputter deposition of a stainless alloy undercoat onto a 14-in.-diameter AlMg-4 disk substrate, e-beam evaporation of an Fe–Co–Cr alloy magnetic layer at an ob...
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| Veröffentlicht in: | Journal of applied physics 1984-03, Vol.55 (6), p.2254-2256 |
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| Hauptverfasser: | , , , , , , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | The fabrication process used in an all-vacuum-deposition thin-metal-film disk will be described. The process consists of planar dc-magnetron sputter deposition of a stainless alloy undercoat onto a 14-in.-diameter AlMg-4 disk substrate, e-beam evaporation of an Fe–Co–Cr alloy magnetic layer at an oblique angle of incidence, planar dc-magnetron sputter deposition of a rhodium overcoat and spray deposition of a liquid lubricant layer. Some mechanical and magnetic performance characteristics of disks, deposited in that fashion, are described. |
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| ISSN: | 0021-8979 1089-7550 |
| DOI: | 10.1063/1.333627 |