Reaction of fluorine atoms with SiO2

Reaction of fluorine atoms with SiO2

The heterogeneous reaction of F atoms with SiO2 (thermal oxide) has been measured using a discharge-flow tube technique. The reaction probability for F atoms is εF= (1.63±0.15) ×10−2 exp(−0.163 eV/kT) for 250

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Veröffentlicht in:Journal of applied physics 1979-01, Vol.50 (10), p.6211-6213
Hauptverfasser: Flamm, D. L., Mogab, C. J., Sklaver, E. R.
Format: Artikel
Sprache:eng
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Zusammenfassung:The heterogeneous reaction of F atoms with SiO2 (thermal oxide) has been measured using a discharge-flow tube technique. The reaction probability for F atoms is εF= (1.63±0.15) ×10−2 exp(−0.163 eV/kT) for 250
ISSN:0021-8979
1089-7550
DOI:10.1063/1.325755