Thin-film interdiffusion. II. Ti-Rh, Ti-Pt, Ti-Rh-Au, and Ti-Au-Rh
Interdiffusion in the Ti/Rh/Au and Ti/Pt thin-film systems is measured using Rutherford backscattering. Extensive grain size measurements are used to interpret the data in terms of grain-boundary-assisted bulk diffusion. At room temperature, rapid grain-boundary diffusion of Au into the fine-grained...
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Veröffentlicht in: | Journal of applied physics 1975-10, Vol.46 (10), p.4284-4290 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | Interdiffusion in the Ti/Rh/Au and Ti/Pt thin-film systems is measured using Rutherford backscattering. Extensive grain size measurements are used to interpret the data in terms of grain-boundary-assisted bulk diffusion. At room temperature, rapid grain-boundary diffusion of Au into the fine-grained Rh layer of the Ti-Rh-Au films occurs, characterized by a diffusion coefficient DB∼10−16 cm2/sec. The bulk diffusion of Au into the grains of the Rh film layer is examined using the grain-boundary-assisted bulk diffusion model, and the influence of surface segregation and size effects is discussed. It is found that interdiffusion in Ti-Rh and Ti-Pt couples is much slower than in Ti-Pd or Ti-Au. Methods are suggested by which the utility of Ti-Rh-Au as a conductor metallization might be improved. |
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ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.321448 |