Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy

Infrared spectroscopy was used to obtain absolute number information on the reaction products during atomic layer deposition of Pt from (methylcyclopentadienyl)trimethylplatinum [(MeCp)PtMe3] and O2. From the detection of CO2 and H2O it was established that the precursor ligands are oxidatively deco...

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Veröffentlicht in:Applied physics letters 2009-07, Vol.95 (1)
Hauptverfasser: Kessels, W. M. M., Knoops, H. C. M., Dielissen, S. A. F., Mackus, A. J. M., van de Sanden, M. C. M.
Format: Artikel
Sprache:eng
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Zusammenfassung:Infrared spectroscopy was used to obtain absolute number information on the reaction products during atomic layer deposition of Pt from (methylcyclopentadienyl)trimethylplatinum [(MeCp)PtMe3] and O2. From the detection of CO2 and H2O it was established that the precursor ligands are oxidatively decomposed during the O2 pulse mainly. Oxygen atoms chemisorbed at the Pt lead to likewise ligand oxidation during the (MeCp)PtMe3 pulse however the detection of a virtually equivalent density of CO2 and CH4 also reveals a concurrent ligand liberation reaction. The surface coverage of chemisorbed oxygen atoms found is consistent with the saturation coverage reported in surface science studies.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.3176946