Low thermal conductivity in Ge2Sb2Te5–SiOx for phase change memory devices

Nanometer scale Ge2Sb2Te5 (GST) domains formed by immiscible mixture of GST-SiOx at room temperature and 180 °C show remarkable suppression in electrical and thermal conductivity. Thermal boundary resistance with increased GST-SiOx interface becomes crucial to the reduction in thermal conductivity....

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Veröffentlicht in:Applied physics letters 2009-06, Vol.94 (24)
Hauptverfasser: Lee, Tae-Yon, Kim, Kijoon H. P., Suh, Dong-Seok, Kim, Cheolkyu, Kang, Youn-Seon, Cahill, David G., Lee, Dongbok, Lee, Min-Hyun, Kwon, Min-Ho, Kim, Ki-Bum, Khang, Yoonho
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Sprache:eng
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Zusammenfassung:Nanometer scale Ge2Sb2Te5 (GST) domains formed by immiscible mixture of GST-SiOx at room temperature and 180 °C show remarkable suppression in electrical and thermal conductivity. Thermal boundary resistance with increased GST-SiOx interface becomes crucial to the reduction in thermal conductivity. These conductivity reductions concurrently result in the reduction in programming current and power consumption in phase change memory devices.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.3155202