Junctionless multigate field-effect transistor

This paper describes a metal-oxide-semiconductor (MOS) transistor concept in which there are no junctions. The channel doping is equal in concentration and type to the source and drain extension doping. The proposed device is a thin and narrow multigate field-effect transistor, which can be fully de...

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Veröffentlicht in:Applied physics letters 2009-02, Vol.94 (5), p.053511-053511-2
Hauptverfasser: Lee, Chi-Woo, Afzalian, Aryan, Akhavan, Nima Dehdashti, Yan, Ran, Ferain, Isabelle, Colinge, Jean-Pierre
Format: Artikel
Sprache:eng
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Zusammenfassung:This paper describes a metal-oxide-semiconductor (MOS) transistor concept in which there are no junctions. The channel doping is equal in concentration and type to the source and drain extension doping. The proposed device is a thin and narrow multigate field-effect transistor, which can be fully depleted and turned off by the gate. Since this device has no junctions, it has simpler fabrication process, less variability, and better electrical properties than classical MOS devices with source and drain P N junctions.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.3079411