Effects of organic film morphology on the formation of Rb clusters on surface coatings in alkali metal vapor cells

Effects of organic film morphology on the formation of Rb clusters on surface coatings in alkali metal vapor cells

Surface relaxation rates differ for spin-polarized alkali atoms interacting with monolayer or bilayer octadecyltrichlorosilane (OTS) coatings. The morphology and composition of Rb vapor-exposed films of OTS have been studied with atomic force microscopy (AFM) and x-ray photoelectron spectroscopy (XP...

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Veröffentlicht in:Applied physics letters 2009-01, Vol.94 (4)
Hauptverfasser: Rampulla, D. M., Oncel, N., Abelev, E., Yi, Y. W., Knappe, S., Bernasek, S. L.
Format: Artikel
Sprache:eng
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Zusammenfassung:Surface relaxation rates differ for spin-polarized alkali atoms interacting with monolayer or bilayer octadecyltrichlorosilane (OTS) coatings. The morphology and composition of Rb vapor-exposed films of OTS have been studied with atomic force microscopy (AFM) and x-ray photoelectron spectroscopy (XPS). On OTS monolayers, numerous small (
ISSN:0003-6951
1077-3118
DOI:10.1063/1.3073711