Characterization of high-k HfO2 films prepared using chemically modified alkoxy-derived solutions

The HfO2 films were prepared using alkoxy-derived precursor solutions. The effects of the chemical composition of precursor solutions on the microstructure development and electrical properties were investigated. The flatness and refractive index of the HfO2 films were improved by using diethanolami...

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Veröffentlicht in:	Journal of applied physics 2009-03, Vol.105 (6)
Hauptverfasser:	Suzuki, Kazuyuki, Kato, Kazumi
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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