Quantification of porosity and deposition rate of nanoporous films grown by oblique-angle deposition

We propose an analytic model that accurately predicts the porosity and deposition rate of nanoporous films grown by oblique-angle deposition. The model employs a single fitting parameter and takes into account geometrical factors as well as surface diffusion. We have determined the porosity and deposition rate from the measured refractive index and thickness of Si O 2 and indium tin oxide nanoporous films deposited at various incident angles. Comparison of experimental data with the model reveals excellent agreement. The theoretical model allows for the predictive control of refractive index, porosity, and deposition rate for a wide range of deposition angles and materials.