Charge injection at carbon nanotube-SiO2 interface

Most single-wall carbon nanotube field-effect transistors show significant hysteresis in their transfer characteristics between forward and reverse gate bias sweeps. It was proposed that the hysteresis is due to a dynamic charging process at the carbon nanotube-dielectric interface. We have studied...

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Veröffentlicht in:Applied physics letters 2008-09, Vol.93 (9)
Hauptverfasser: Ong, Hock Guan, Cheah, Jun Wei, Chen, Lang, TangTang, Hosea, Xu, Yanping, Li, Bing, Zhang, Hua, Li, Lain-Jong, Wang, Junling
Format: Artikel
Sprache:eng
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Zusammenfassung:Most single-wall carbon nanotube field-effect transistors show significant hysteresis in their transfer characteristics between forward and reverse gate bias sweeps. It was proposed that the hysteresis is due to a dynamic charging process at the carbon nanotube-dielectric interface. We have studied the charge injection and subsequent discharging processes at the carbon nanotube-SiO2 interface using electrostatic force microscopy. It was observed that the water layer assists charge diffusion on the dielectric surface.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2978249