Sub- 30 - nm patterning on quartz for imprint lithography templates
A parallel and economical method for obtaining nanoscale features on large-area quartz substrates has been developed for use in nanoimprint lithography template fabrication. Self-assembled multilayer films (molecular rulers) are used in conjunction with photolithographically defined metallic feature...
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| Veröffentlicht in: | Applied physics letters 2008-08, Vol.93 (8), p.083123-083123-3 |
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| Hauptverfasser: | , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | A parallel and economical method for obtaining nanoscale features on large-area quartz substrates has been developed for use in nanoimprint lithography template fabrication. Self-assembled multilayer films (molecular rulers) are used in conjunction with photolithographically defined metallic features to generate precise nanogaps with sub-
30
-
nm
resolution on quartz substrates. These nanopatterns are then transferred to the quartz substrates using the metallic thin films as etch masks. |
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| ISSN: | 0003-6951 1077-3118 |
| DOI: | 10.1063/1.2963982 |