Power scaling of an extreme ultraviolet light source for future lithography

For future lithography applications, high-power extreme ultraviolet (EUV) light sources are needed at a central wavelength of 13.5 nm within 2% bandwidth. We have demonstrated that from a physics point of view the Philips alpha-prototype source concept is scalable up to the power levels required for high-volume manufacturing (HVM) purposes. Scalability is shown both in frequency, up to 100 kHz , and pulse energy, up to 55 mJ collectable EUV per pulse, which allows us to find an optimal working point for future HVM sources within a wide parameter space.