Phase separation behavior of Ge2Sb2Te5 line structure during electrical stress biasing

We report the breakdown behavior of a patterned Ge2Sb2Te5 multiline structure during the voltage-driven electric stress biasing. Scanning Auger microscope analysis shows that the breakdown process accompanies with a phase separation of Ge2Sb2Te5 into an Sb, Te-rich phase and a Ge-rich phase. The pha...

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Veröffentlicht in:Applied physics letters 2008-03, Vol.92 (11)
Hauptverfasser: Nam, Sung-Wook, Kim, Cheolkyu, Kwon, Min-Ho, Lee, Hyo-Sung, Wi, Jung-Sub, Lee, Dongbok, Lee, Tae-Yon, Khang, Yoonho, Kim, Ki-Bum
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Sprache:eng ; jpn
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Zusammenfassung:We report the breakdown behavior of a patterned Ge2Sb2Te5 multiline structure during the voltage-driven electric stress biasing. Scanning Auger microscope analysis shows that the breakdown process accompanies with a phase separation of Ge2Sb2Te5 into an Sb, Te-rich phase and a Ge-rich phase. The phase separation is explained by the incongruent melting of Ge2Sb2Te5 based on the pseudobinary phase diagram between Sb2Te3 and GeTe. It is claimed that this phase separation behavior by incongruent melting provides one of the plausible mechanisms of the device failure in a phase change memory.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2899967