Ferromagnetic semiconductor Ge1−xCrxTe with a Curie temperature of 180K

A IV-VI ferromagnetic semiconductor Ge1−xCrxTe (x∼0.06) with Curie temperature TC up to 180K is grown by molecular-beam epitaxy. The magnetization is well reproduced from anomalous Hall effect. As the Te∕Cr flux ratio increases during the growth of Ge1−xCrxTe, the spontaneous magnetization and the m...

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Veröffentlicht in:Applied physics letters 2007-08, Vol.91 (9)
Hauptverfasser: Fukuma, Y., Asada, H., Moritake, N., Irisa, T., Koyanagi, T.
Format: Artikel
Sprache:eng
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Zusammenfassung:A IV-VI ferromagnetic semiconductor Ge1−xCrxTe (x∼0.06) with Curie temperature TC up to 180K is grown by molecular-beam epitaxy. The magnetization is well reproduced from anomalous Hall effect. As the Te∕Cr flux ratio increases during the growth of Ge1−xCrxTe, the spontaneous magnetization and the magnetic anisotropy are decreased and TC is increased. On the other hand, the Te∕Cr flux ratio over 3.6 leads to formation of Cr–Te precipitations. The magnetoresistance measurements reveal that the increase of TC is attributed to the decrease of nonstoichiometric defects.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2772669