Ferromagnetic semiconductor Ge1−xCrxTe with a Curie temperature of 180K
A IV-VI ferromagnetic semiconductor Ge1−xCrxTe (x∼0.06) with Curie temperature TC up to 180K is grown by molecular-beam epitaxy. The magnetization is well reproduced from anomalous Hall effect. As the Te∕Cr flux ratio increases during the growth of Ge1−xCrxTe, the spontaneous magnetization and the m...
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Veröffentlicht in: | Applied physics letters 2007-08, Vol.91 (9) |
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Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A IV-VI ferromagnetic semiconductor Ge1−xCrxTe (x∼0.06) with Curie temperature TC up to 180K is grown by molecular-beam epitaxy. The magnetization is well reproduced from anomalous Hall effect. As the Te∕Cr flux ratio increases during the growth of Ge1−xCrxTe, the spontaneous magnetization and the magnetic anisotropy are decreased and TC is increased. On the other hand, the Te∕Cr flux ratio over 3.6 leads to formation of Cr–Te precipitations. The magnetoresistance measurements reveal that the increase of TC is attributed to the decrease of nonstoichiometric defects. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.2772669 |