Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition

The thermodynamic properties and interfacial characteristics of HfO2 thin films that were deposited by the direct plasma atomic layer deposition (DPALD) method are investigated. The as-deposited HfO2 films that were deposited by the DPALD method show crystallization of the HfO2 layers, which initiat...

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Veröffentlicht in:	Applied physics letters 2007-05, Vol.90 (22)
Hauptverfasser:	Kim, Inhoe, Kuk, Seoungwoo, Kim, Seokhoon, Kim, Jinwoo, Jeon, Hyeongtag, Cho, M.-H., Chung, K.-B.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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