High thermal stability of cross-linked aromatic self-assembled monolayers: Nanopatterning via selective thermal desorption
An extremely high thermal stability of electron cross-linked biphenyl self-assembled monolayers (SAMs) is reported. The authors found that pristine biphenylthiol SAMs desorb at ∼ 400 K from gold surfaces, which is induced by a breaking of C-S bonds. Despite of a similar bond cleavage in cross-linked...
Gespeichert in:
Veröffentlicht in: | Applied physics letters 2007-01, Vol.90 (5), p.053102-053102-3 |
---|---|
Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | An extremely high thermal stability of electron cross-linked biphenyl self-assembled monolayers (SAMs) is reported. The authors found that pristine biphenylthiol SAMs desorb at
∼
400
K
from gold surfaces, which is induced by a breaking of C-S bonds. Despite of a similar bond cleavage in cross-linked SAMs, these remain on the surface up to
1000
K
, which is the highest temperature reported for a SAM. When patterns of pristine and cross-linked SAMs are heated, the pristine regions desorb, and the cross-linked regions remain on the surface. The authors show that this thermal desorption lithography can be utilized for the fabrication of molecular surface nanostructures. |
---|---|
ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.2437091 |