High thermal stability of cross-linked aromatic self-assembled monolayers: Nanopatterning via selective thermal desorption

An extremely high thermal stability of electron cross-linked biphenyl self-assembled monolayers (SAMs) is reported. The authors found that pristine biphenylthiol SAMs desorb at ∼ 400 K from gold surfaces, which is induced by a breaking of C-S bonds. Despite of a similar bond cleavage in cross-linked...

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Veröffentlicht in:Applied physics letters 2007-01, Vol.90 (5), p.053102-053102-3
Hauptverfasser: Turchanin, A., El-Desawy, M., Gölzhäuser, A.
Format: Artikel
Sprache:eng
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Zusammenfassung:An extremely high thermal stability of electron cross-linked biphenyl self-assembled monolayers (SAMs) is reported. The authors found that pristine biphenylthiol SAMs desorb at ∼ 400 K from gold surfaces, which is induced by a breaking of C-S bonds. Despite of a similar bond cleavage in cross-linked SAMs, these remain on the surface up to 1000 K , which is the highest temperature reported for a SAM. When patterns of pristine and cross-linked SAMs are heated, the pristine regions desorb, and the cross-linked regions remain on the surface. The authors show that this thermal desorption lithography can be utilized for the fabrication of molecular surface nanostructures.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2437091