Combinatorial-mold imprint lithography: A versatile technique for fabrication of three-dimensional polymer structures

A two-step fabrication technique based on nanoimprint lithography is described for the fabrication of three-dimensional micro- and nanostructures. By combining simple two-dimensional geometries from two molds, complex and useful three-dimensional structures are obtained. The careful selection of mol...

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Veröffentlicht in:Applied physics letters 2006-07, Vol.89 (2)
Hauptverfasser: Low, Hong Yee, Zhao, Wei, Dumond, Jarrett
Format: Artikel
Sprache:eng
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Zusammenfassung:A two-step fabrication technique based on nanoimprint lithography is described for the fabrication of three-dimensional micro- and nanostructures. By combining simple two-dimensional geometries from two molds, complex and useful three-dimensional structures are obtained. The careful selection of mold geometries constitutes a simplified and efficient approach toward building up desirable three-dimensional structures without resorting to the use of a sacrificial process or components. Three-dimensional structures fabricated for a variety of specific applications are presented using both thermoplastic and cross-linked polymer materials.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2219148