Comparison of valence band x-ray photoelectron spectrum between Al–N-codoped and N-doped ZnO films

The valence band structures of Al–N-codoped [ZnO:(Al, N)] and N-doped (ZnO:N) ZnO films were studied by normal and soft x-ray photoelectron spectroscopy. The valence-band maximum of ZnO:(Al, N) shifts up to Fermi energy level by about 300 meV compared with that of ZnO:N. Such a shift can be attribut...

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Veröffentlicht in:Applied physics letters 2006-02, Vol.88 (6)
Hauptverfasser: Cong, G. W., Peng, W. Q., Wei, H. Y., Han, X. X., Wu, J. J., Liu, X. L., Zhu, Q. S., Wang, Z. G., Lu, J. G., Ye, Z. Z., Zhu, L. P., Qian, H. J., Su, R., Hong, C. H., Zhong, J., Ibrahim, K., Hu, T. D.
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Sprache:eng
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Zusammenfassung:The valence band structures of Al–N-codoped [ZnO:(Al, N)] and N-doped (ZnO:N) ZnO films were studied by normal and soft x-ray photoelectron spectroscopy. The valence-band maximum of ZnO:(Al, N) shifts up to Fermi energy level by about 300 meV compared with that of ZnO:N. Such a shift can be attributed to the existence of a kind of Al–N in ZnO:(Al, N), as supported by core level XPS spectra and comparison of modified Auger parameters. Al–N increased the relative quantity of Zn–N in ZnO:(Al, N), while N–N decreased that of Zn–N in ZnO:N.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2171804