Direct deposition of continuous metal nanostructures by thermal dip-pen nanolithography

We describe the deposition of continuous metal nanostructures onto glass and silicon using a heated atomic force microscope cantilever. Like a miniature soldering iron, the cantilever tip is coated with indium metal, which can be deposited onto a surface forming lines of a width less than 80 nm. Dep...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied physics letters 2006-01, Vol.88 (3), p.033104-033104-3
Hauptverfasser: Nelson, B. A., King, W. P., Laracuente, A. R., Sheehan, P. E., Whitman, L. J.
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:We describe the deposition of continuous metal nanostructures onto glass and silicon using a heated atomic force microscope cantilever. Like a miniature soldering iron, the cantilever tip is coated with indium metal, which can be deposited onto a surface forming lines of a width less than 80 nm. Deposition is controlled using a heater integrated into the cantilever. When the cantilever is unheated, no metal is deposited from the tip, allowing the writing to be registered to existing features on the surface. We demonstrate direct-write circuit repair by writing an electrical connection between two metal electrodes separated by a submicron gap.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2164394