Fabrication of cerium-doped LaNiO3 thin films on LaAlO3 (100) substrate by pulsed laser deposition

In this study we report the fabrication of La1−xCexNiO3(0⩽x⩽0.4) thin films on a LaAlO3 (100) substrate by pulsed laser deposition where the cerium ions are believed to be in the Ce (IV) oxidation state. At low Ce concentrations, the films grow in the (100) direction with a pseudocubic structure and...

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Veröffentlicht in:Journal of applied physics 2005-11, Vol.98 (9)
Hauptverfasser: Lekshmi, I. Chaitanya, Gayen, Arup, Sarma, D. D., Hegde, M. S., Chockalingam, S. P., Chandrasekhar, N.
Format: Artikel
Sprache:eng
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Zusammenfassung:In this study we report the fabrication of La1−xCexNiO3(0⩽x⩽0.4) thin films on a LaAlO3 (100) substrate by pulsed laser deposition where the cerium ions are believed to be in the Ce (IV) oxidation state. At low Ce concentrations, the films grow in the (100) direction with a pseudocubic structure and above x∼0.3, they exhibit a change in the crystal symmetry. Core-level photoelectron spectroscopic studies of the thin films deposited have shown that the cerium exists in the +4 oxidation state. Correspondingly, the nickel exhibits mixed valency in these thin films. Conductivity of this highly metallic system progressively decreases as more and more Ce is doped. In the range 0.3
ISSN:0021-8979
1089-7550
DOI:10.1063/1.2128046