Effect of inclined quantum wells on macroscopic capacitance-voltage response of Schottky contacts: Cubic inclusions in hexagonal SiC
Finite-element calculations of Schottky diode capacitance-voltage ( C - V ) curves show that an array of subsurface inclined quantum wells (QWs) produce negligible change in shape and slope of C - V curves, but significantly reduce the intercept voltage. This is particularly important for hexagonal...
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Veröffentlicht in: | Applied physics letters 2005-05, Vol.86 (22), p.222109-222109-3 |
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creator | Park, K.-B. Ding, Y. Pelz, J. P. Mikhov, M. K. Wang, Y. Skromme, B. J. |
description | Finite-element calculations of Schottky diode capacitance-voltage
(
C
-
V
)
curves show that an array of subsurface
inclined
quantum wells (QWs) produce negligible change in shape and slope of
C
-
V
curves, but significantly reduce the intercept voltage. This is particularly important for hexagonal SiC, in which current- or process-induced cubic inclusions are known to behave as electron QWs. These calculations naturally explain the surprisingly large effect of cubic inclusions on the apparent 4H-SiC Schottky barrier determined by
C
-
V
measurements, and together with the measured
C
-
V
data indicate the QW subband energy in the inclusions to be
∼
0.51
eV
below the host 4H-SiC conduction band. |
doi_str_mv | 10.1063/1.1935757 |
format | Article |
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(
C
-
V
)
curves show that an array of subsurface
inclined
quantum wells (QWs) produce negligible change in shape and slope of
C
-
V
curves, but significantly reduce the intercept voltage. This is particularly important for hexagonal SiC, in which current- or process-induced cubic inclusions are known to behave as electron QWs. These calculations naturally explain the surprisingly large effect of cubic inclusions on the apparent 4H-SiC Schottky barrier determined by
C
-
V
measurements, and together with the measured
C
-
V
data indicate the QW subband energy in the inclusions to be
∼
0.51
eV
below the host 4H-SiC conduction band.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.1935757</identifier><identifier>CODEN: APPLAB</identifier><language>eng</language><publisher>American Institute of Physics</publisher><ispartof>Applied physics letters, 2005-05, Vol.86 (22), p.222109-222109-3</ispartof><rights>2005 American Institute of Physics</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c284t-12e92f56ff78bab71c059b8620b4296bf0444ee70d23c49ef14ecf98e478a3453</citedby><cites>FETCH-LOGICAL-c284t-12e92f56ff78bab71c059b8620b4296bf0444ee70d23c49ef14ecf98e478a3453</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://pubs.aip.org/apl/article-lookup/doi/10.1063/1.1935757$$EHTML$$P50$$Gscitation$$H</linktohtml><link.rule.ids>314,776,780,790,1553,4498,27901,27902,76127,76133</link.rule.ids></links><search><creatorcontrib>Park, K.-B.</creatorcontrib><creatorcontrib>Ding, Y.</creatorcontrib><creatorcontrib>Pelz, J. P.</creatorcontrib><creatorcontrib>Mikhov, M. K.</creatorcontrib><creatorcontrib>Wang, Y.</creatorcontrib><creatorcontrib>Skromme, B. J.</creatorcontrib><title>Effect of inclined quantum wells on macroscopic capacitance-voltage response of Schottky contacts: Cubic inclusions in hexagonal SiC</title><title>Applied physics letters</title><description>Finite-element calculations of Schottky diode capacitance-voltage
(
C
-
V
)
curves show that an array of subsurface
inclined
quantum wells (QWs) produce negligible change in shape and slope of
C
-
V
curves, but significantly reduce the intercept voltage. This is particularly important for hexagonal SiC, in which current- or process-induced cubic inclusions are known to behave as electron QWs. These calculations naturally explain the surprisingly large effect of cubic inclusions on the apparent 4H-SiC Schottky barrier determined by
C
-
V
measurements, and together with the measured
C
-
V
data indicate the QW subband energy in the inclusions to be
∼
0.51
eV
below the host 4H-SiC conduction band.</description><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNp1kD1PwzAQhi0EEqUw8A-8MqTYsRMnDEgoKh8SEkNhthz33BpSO40doDs_nEQtI9PdSc-9unsQuqRkRknOrumMliwTmThCE0qESBilxTGaEEJYkpcZPUVnIbwPY5YyNkE_c2NAR-wNtk431sESb3vlYr_BX9A0AXuHN0p3PmjfWo21apW2UTkNyadvoloB7iC03gUYUxZ67WP82GHtXVQ6hhtc9fWwOMb3wQ7c0OI1fKuVd6rBC1udoxOjmgAXhzpFb_fz1-oxeX55eKrunhOdFjwmNIUyNVlujChqVQuqSVbWRZ6SmqdlXhvCOQcQZJkyzUswlIM2ZQFcFIrxjE3R1T53fCd0YGTb2Y3qdpISOeqTVB70Deztng3jt3G4-39471B6I_8cyi37BbyZehY</recordid><startdate>20050530</startdate><enddate>20050530</enddate><creator>Park, K.-B.</creator><creator>Ding, Y.</creator><creator>Pelz, J. P.</creator><creator>Mikhov, M. K.</creator><creator>Wang, Y.</creator><creator>Skromme, B. J.</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20050530</creationdate><title>Effect of inclined quantum wells on macroscopic capacitance-voltage response of Schottky contacts: Cubic inclusions in hexagonal SiC</title><author>Park, K.-B. ; Ding, Y. ; Pelz, J. P. ; Mikhov, M. K. ; Wang, Y. ; Skromme, B. J.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c284t-12e92f56ff78bab71c059b8620b4296bf0444ee70d23c49ef14ecf98e478a3453</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Park, K.-B.</creatorcontrib><creatorcontrib>Ding, Y.</creatorcontrib><creatorcontrib>Pelz, J. P.</creatorcontrib><creatorcontrib>Mikhov, M. K.</creatorcontrib><creatorcontrib>Wang, Y.</creatorcontrib><creatorcontrib>Skromme, B. J.</creatorcontrib><collection>CrossRef</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Park, K.-B.</au><au>Ding, Y.</au><au>Pelz, J. P.</au><au>Mikhov, M. K.</au><au>Wang, Y.</au><au>Skromme, B. J.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effect of inclined quantum wells on macroscopic capacitance-voltage response of Schottky contacts: Cubic inclusions in hexagonal SiC</atitle><jtitle>Applied physics letters</jtitle><date>2005-05-30</date><risdate>2005</risdate><volume>86</volume><issue>22</issue><spage>222109</spage><epage>222109-3</epage><pages>222109-222109-3</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>Finite-element calculations of Schottky diode capacitance-voltage
(
C
-
V
)
curves show that an array of subsurface
inclined
quantum wells (QWs) produce negligible change in shape and slope of
C
-
V
curves, but significantly reduce the intercept voltage. This is particularly important for hexagonal SiC, in which current- or process-induced cubic inclusions are known to behave as electron QWs. These calculations naturally explain the surprisingly large effect of cubic inclusions on the apparent 4H-SiC Schottky barrier determined by
C
-
V
measurements, and together with the measured
C
-
V
data indicate the QW subband energy in the inclusions to be
∼
0.51
eV
below the host 4H-SiC conduction band.</abstract><pub>American Institute of Physics</pub><doi>10.1063/1.1935757</doi></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0003-6951 |
ispartof | Applied physics letters, 2005-05, Vol.86 (22), p.222109-222109-3 |
issn | 0003-6951 1077-3118 |
language | eng |
recordid | cdi_crossref_primary_10_1063_1_1935757 |
source | AIP Journals Complete; AIP Digital Archive |
title | Effect of inclined quantum wells on macroscopic capacitance-voltage response of Schottky contacts: Cubic inclusions in hexagonal SiC |
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