Effect of inclined quantum wells on macroscopic capacitance-voltage response of Schottky contacts: Cubic inclusions in hexagonal SiC
Finite-element calculations of Schottky diode capacitance-voltage ( C - V ) curves show that an array of subsurface inclined quantum wells (QWs) produce negligible change in shape and slope of C - V curves, but significantly reduce the intercept voltage. This is particularly important for hexagonal...
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Veröffentlicht in: | Applied physics letters 2005-05, Vol.86 (22), p.222109-222109-3 |
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Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Finite-element calculations of Schottky diode capacitance-voltage
(
C
-
V
)
curves show that an array of subsurface
inclined
quantum wells (QWs) produce negligible change in shape and slope of
C
-
V
curves, but significantly reduce the intercept voltage. This is particularly important for hexagonal SiC, in which current- or process-induced cubic inclusions are known to behave as electron QWs. These calculations naturally explain the surprisingly large effect of cubic inclusions on the apparent 4H-SiC Schottky barrier determined by
C
-
V
measurements, and together with the measured
C
-
V
data indicate the QW subband energy in the inclusions to be
∼
0.51
eV
below the host 4H-SiC conduction band. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.1935757 |