Effect of inclined quantum wells on macroscopic capacitance-voltage response of Schottky contacts: Cubic inclusions in hexagonal SiC

Finite-element calculations of Schottky diode capacitance-voltage ( C - V ) curves show that an array of subsurface inclined quantum wells (QWs) produce negligible change in shape and slope of C - V curves, but significantly reduce the intercept voltage. This is particularly important for hexagonal...

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Veröffentlicht in:Applied physics letters 2005-05, Vol.86 (22), p.222109-222109-3
Hauptverfasser: Park, K.-B., Ding, Y., Pelz, J. P., Mikhov, M. K., Wang, Y., Skromme, B. J.
Format: Artikel
Sprache:eng
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Zusammenfassung:Finite-element calculations of Schottky diode capacitance-voltage ( C - V ) curves show that an array of subsurface inclined quantum wells (QWs) produce negligible change in shape and slope of C - V curves, but significantly reduce the intercept voltage. This is particularly important for hexagonal SiC, in which current- or process-induced cubic inclusions are known to behave as electron QWs. These calculations naturally explain the surprisingly large effect of cubic inclusions on the apparent 4H-SiC Schottky barrier determined by C - V measurements, and together with the measured C - V data indicate the QW subband energy in the inclusions to be ∼ 0.51 eV below the host 4H-SiC conduction band.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1935757