Epitaxial growth of NaxCoO2 thin films by pulsed-laser deposition
Single-phase thin films of NaxCoO2 have been grown epitaxially by pulsed-laser deposition technique. The growth conditions were studied based on the logpO2−1∕T phase diagram of Co–O2 using different types of substrate materials. For Na0.58CoO2, metallic behavior is found down to 4.2K. At the request...
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| Veröffentlicht in: | Applied physics letters 2005-05, Vol.86 (19) |
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| container_title | Applied physics letters |
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| creator | Krockenberger, Y. Fritsch, I. Cristiani, G. Matveev, A. Alff, L. Habermeier, H.-U. Keimer, B. |
| description | Single-phase thin films of NaxCoO2 have been grown epitaxially by pulsed-laser deposition technique. The growth conditions were studied based on the logpO2−1∕T phase diagram of Co–O2 using different types of substrate materials. For Na0.58CoO2, metallic behavior is found down to 4.2K.
At the request of the authors, this article is being retracted effective 4 January 2006. |
| doi_str_mv | 10.1063/1.1927272 |
| format | Article |
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At the request of the authors, this article is being retracted effective 4 January 2006.</abstract><cop>Melville</cop><pub>American Institute of Physics</pub><doi>10.1063/1.1927272</doi><tpages>3</tpages><oa>free_for_read</oa></addata></record> |
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| ispartof | Applied physics letters, 2005-05, Vol.86 (19) |
| issn | 0003-6951 1077-3118 |
| language | eng |
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| source | AIP Journals Complete; AIP Digital Archive |
| subjects | Epitaxial growth Phase diagrams Pulsed laser deposition Pulsed lasers Substrates Thin films |
| title | Epitaxial growth of NaxCoO2 thin films by pulsed-laser deposition |
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