On the band structure lineup of ZnO heterostructures
The interface-induced gap states (IFIGS) are the fundamental mechanism which determines the band structure lineup at semiconductor interfaces. The valence-band offsets of semiconductor heterostructures are given by the difference of the respective IFIGS branch-point energies and electric-dipole term...
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Veröffentlicht in: | Applied physics letters 2005-04, Vol.86 (16), p.162101-162101-2 |
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Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | The interface-induced gap states (IFIGS) are the fundamental mechanism which determines the band structure lineup at semiconductor interfaces. The valence-band offsets of semiconductor heterostructures are given by the difference of the respective IFIGS branch-point energies and electric-dipole terms which may be omitted for elemental group-IV semiconductors, SiC, as well as the III-V, II-VI, and
I
-
III
-
VI
2
compounds and alloys. The branch-point energy of ZnO is determined as
3.04
±
0.21
eV
from an analysis of experimental valence-band offsets reported for various ZnO heterostructures. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.1897436 |