Blue emission from CaS:Cu,F thin-film electroluminescent device fabricated on Si substrate
Thin-film electroluminescent (TFEL) devices were fabricated on Si substrates by using Si O 2 and Y 2 O 3 films as insulator layers, and ZnS films as buffer layers. The device annealed at 850 ° C for 10 min in Ar showed a purple EL with a peak at 425 nm . Commission Internationale de l'Eclairage...
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Veröffentlicht in: | Applied physics letters 2004-10, Vol.85 (17), p.3729-3730 |
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Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | Thin-film electroluminescent (TFEL) devices were fabricated on Si substrates by using
Si
O
2
and
Y
2
O
3
films as insulator layers, and ZnS films as buffer layers. The device annealed at
850
°
C
for
10
min
in Ar showed a purple EL with a peak at
425
nm
. Commission Internationale de l'Eclairage (CIE) color coordinates of
x
=
0.217
,
y
=
0.223
under driving at
220
V
0
−
p
of
1
kHz
trapezoidal wave. The purple EL from CaS:Cu TFEL device could be achieved, although luminance was weak, and a little longer wavelength component was included. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.1812381 |