Blue emission from CaS:Cu,F thin-film electroluminescent device fabricated on Si substrate

Thin-film electroluminescent (TFEL) devices were fabricated on Si substrates by using Si O 2 and Y 2 O 3 films as insulator layers, and ZnS films as buffer layers. The device annealed at 850 ° C for 10 min in Ar showed a purple EL with a peak at 425 nm . Commission Internationale de l'Eclairage...

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Veröffentlicht in:Applied physics letters 2004-10, Vol.85 (17), p.3729-3730
Hauptverfasser: Hakamata, Shintaro, Ehara, Mami, Fukada, Haruki, Kominami, Hiroko, Nakanishi, Yoichiro, Hatanaka, Yoshinori
Format: Artikel
Sprache:eng
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Zusammenfassung:Thin-film electroluminescent (TFEL) devices were fabricated on Si substrates by using Si O 2 and Y 2 O 3 films as insulator layers, and ZnS films as buffer layers. The device annealed at 850 ° C for 10 min in Ar showed a purple EL with a peak at 425 nm . Commission Internationale de l'Eclairage (CIE) color coordinates of x = 0.217 , y = 0.223 under driving at 220 V 0 − p of 1 kHz trapezoidal wave. The purple EL from CaS:Cu TFEL device could be achieved, although luminance was weak, and a little longer wavelength component was included.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1812381