Precise formation of nanoscopic dots on polystyrene film using z -lift electrostatic lithography

Z -lift electrostatic lithography on thin ( 10 - 50 nm ) polystyrene (PS) films is discussed. The height of nanostructures can be controlled via mechanically drawing or depressing the cantilever height ( z -lift) during the application of a voltage. Since polymer is not removed or crosslinked during structure formation, the features are erasable. Various aspects such as voltage doses, film thickness, z -lift height, and rate are explored. Structure height formation relies mainly on, and is proportional, to the z -lift magnitude; however, only a narrow range of voltages yields structures for any given film thickness. Structures ranging from 0 - 10 nm are produced on a 40 nm thick PS film using − 36 V by varying the z -lift on a 0.1 - 0.9 N ∕ m cantilever from − 20 nm to + 400 nm .