Primary processes of the photolysis of ethylenimine at Xe and Kr resonance lines

The direct and sensitized photolyses of ethylenimine vapor at Kr and Xe resonance lines have been studied. The hydrocarbon products are ethylene, ethane, methane, and small amounts of acetylene, propane, and n -butane. Other products detected are hydrogen, ammonia, and the dimers of ethylenimino radicals. The effect of added oxygen or ethylene has also been investigated. Emphasis being laid on the formations of methyl radicals, ethylene, and acetylene, the quantum yields of primary processes are determined as follows; (CH2)2NH + h ν → C2H4 + NH [I], CH3 + (H2CN) [II], and C2H2 + (NH3) [III]; at Xe resonance lines φI = 0.36, φII = 0.41, φIII = 0.028; at Kr resonance lines φI = 0.22, φII = 0.13, φIII = 0.028. Xe and Kr sensitized photolyses have also been studied. A very slight difference in the product distribution between the direct and sensitized photodecompositions has been observed.