ELECTRICAL RESISTIVITY MODEL FOR POLYCRYSTALLINE FILMS: THE CASE OF SPECULAR REFLECTION AT EXTERNAL SURFACES
A model is developed for estimating effects due to electron scattering from grain boundaries, occurring simultaneously with background scattering. Since grain-boundary effects are negligible in bulk materials, the model is particularly relevant to polycrystalline metal films in which a very fine-gra...
Gespeichert in:
Veröffentlicht in: | Applied physics letters 1969-06, Vol.14 (11), p.345-347 |
---|---|
Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A model is developed for estimating effects due to electron scattering from grain boundaries, occurring simultaneously with background scattering. Since grain-boundary effects are negligible in bulk materials, the model is particularly relevant to polycrystalline metal films in which a very fine-grained structure is often found. It is shown by solution of the appropriate Boltzmann equation, that the total resistivity can be strongly dominated by grain-boundary scattering. If grain size increases with film thickness, a marked dependence of resistivity on thickness exists, even when scattering from external surfaces is negligible or is completely specular. |
---|---|
ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.1652680 |