High-speed, short-channel polycrystalline silicon thin-film transistors

Results are presented on the performance of low-temperature, short-channel polycrystalline silicon (poly-Si) thin-film transistors (TFTs), with channel length down to 0.5 μm, and scaled gate oxide thickness down to 20 nm. Good TFT switching characteristics were obtained, and the uniformity of short-...

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Veröffentlicht in:Applied physics letters 2004-01, Vol.84 (2), p.293-295
Hauptverfasser: Brotherton, S. D., Glasse, C., Glaister, C., Green, P., Rohlfing, F., Ayres, J. R.
Format: Artikel
Sprache:eng
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Zusammenfassung:Results are presented on the performance of low-temperature, short-channel polycrystalline silicon (poly-Si) thin-film transistors (TFTs), with channel length down to 0.5 μm, and scaled gate oxide thickness down to 20 nm. Good TFT switching characteristics were obtained, and the uniformity of short-channel TFTs was shown to have a standard deviation of better then 10%, even for channel widths as small as 4 μm. The 0.5 μm TFTs have been incorporated into a 15-stage complementary pair metal-oxide-Si transistor ring oscillator, which, at a supply voltage of 3 V, operated with a delay/stage of ∼0.1 ns.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1639137