Electron-beam-induced strain within InGaN quantum wells: False indium “cluster” detection in the transmission electron microscope

InGaN quantum wells have been found to be extremely sensitive to exposure to the electron beam in the transmission electron microscope (TEM). High-resolution TEM images acquired immediately after first irradiating a region of quantum well indicates no gross fluctuations of indium content in the InGa...

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Veröffentlicht in:Applied physics letters 2003-12, Vol.83 (26), p.5419-5421
Hauptverfasser: Smeeton, T. M., Kappers, M. J., Barnard, J. S., Vickers, M. E., Humphreys, C. J.
Format: Artikel
Sprache:eng
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Zusammenfassung:InGaN quantum wells have been found to be extremely sensitive to exposure to the electron beam in the transmission electron microscope (TEM). High-resolution TEM images acquired immediately after first irradiating a region of quantum well indicates no gross fluctuations of indium content in the InGaN alloy. During only a brief period of irradiation, inhomogeneous strain is introduced in the material due to electron beam damage. This strain is very similar to that expected from genuine nanometer-scale indium composition fluctuations which suggests there is the possibility of falsely detecting indium-rich “clusters” in a homogeneous quantum well.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1636534