Small angle x-ray scattering for sub-100 nm pattern characterization

Characterization of sub-100 nm photolithographic patterns with nanometer scale resolution is demonstrated using small angle x-ray scattering. The transmission scattering geometry employed potentially enables high throughput measurements for future technology nodes of the semiconductor industry, orga...

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Veröffentlicht in:Appl. Phys. Lett 2003-11, Vol.83 (19), p.4059-4061
Hauptverfasser: Jones, Ronald L., Hu, Tengjiao, Lin, Eric K., Wu, Wen-Li, Kolb, Rainer, Casa, Diego M., Bolton, Patrick J., Barclay, George G.
Format: Artikel
Sprache:eng
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Zusammenfassung:Characterization of sub-100 nm photolithographic patterns with nanometer scale resolution is demonstrated using small angle x-ray scattering. The transmission scattering geometry employed potentially enables high throughput measurements for future technology nodes of the semiconductor industry, organic and inorganic nanoscale devices, and three-dimensional structures. The method is demonstrated through the characterization of a series of polymer photoresist gratings using a synchrotron x-ray source. Quantities, such as periodicity and line width, are extracted using minimal modeling. Additional quantities and the potential of a laboratory-based x-ray system are briefly discussed.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1622793